Sagantec Launches New DFM Solution Integrated with Mentor Graphics' Calibre LFD

Sagantec has developed a DFM solution for correcting lithography hot spots found in physical IC designs in collaboration with Mentor Graphics. The new DFM flow uses Mentor Graphics Calibre LFD (litho friendly design) tool to analyze the design layout and detect lithography hot spots. Sagantec's DFM-Fix tool uses the Calibre LFD analysis results to correct hot spots and optimize the overall layout, which is then verified by Calibre LFD.

This solution addresses a wide range of lithography-related issues and works with multiple design styles, including memory, custom and digital, and multiple levels of design, including library, IP core, block and full-chip. Sagantec is presenting the new solution at the Design Automation Conference, June 4-7 in San Diego.

"Our strategy is to work with other leading edge DFM suppliers to address the critical issues facing designers moving to the most advanced process nodes," said Hillel Ofek, President and CEO at Sagantec. "We are very pleased to collaborate with Mentor Graphics to offer a layout correction solution to our mutual customers."

"The Calibre nm Platform provides the most advanced technology foundation for DFM in the industry," said Joe Sawicki, vice president and general manger, Design-to-Silicon Division, Mentor Graphics. "We welcome the opportunity to offer additional value for our customers through integration with tools from other leading edge suppliers like Sagantec."

Sagantec