Low-Power 45-nm Reference Flow for Common Platform Technology
(Product News, 08 Aug 2008 )
The low-power RTL-to-GDSII design flow for ICs targeted at 45nm processes of Common Platform technology -- an alliance among IBM, Chartered Semiconductor Manufacturing and Samsung. Based on Magma's Talus IC implementation system, including Talus Power Pro, the flow uses various techniques throughout implementation and within a single environment to minimize power consumption while maximizing quality of results and reducing turnaround time. The reference flow collaboration around the Talus system, which is targeted at reducing power consumption and supporting UPF, included implementing a complex, hierarchical design using a Unified Power Format (UPF)-compliant, low-power design intent specification to drive automatic creation of multiple power domains and level-shifter, isolation-cell and retention-flop insertion. The design was implemented using the Common Platform 45-nm low-power process.
